Non-Silicone for Photoresist Developers
Defoamer EC-D (RDZ-1610) is a fully organic non-Silicone, water soluble defoamer that rinses readily in cold water and leaves no residue. It is designed for systems where clean rinsing is essential. It is odor-free and biodegradable. Defoamer EC-D is ideal for defoaming aqueous photo-resist developers, and may be added to diluted Sodium Carbonate developer solutions to be fed automatically with the developer solution.
MAKE-UP:
Defoamer EC-D (RDZ-1610) is used typically at 100 to 5000 ppm, depending on film, film loading and equipment. Try 1000 ppm to start. This is equivalent to 0.10oz./gallon, or 1 ml/liter.
OPERATION:
Use at 70o to 100o F.
Defoamer EC-D (RDZ-1610) permanently defoams. It will not be deactivated or "used up" in solution, however, since it is the photoresist that causes foaming, as more resist is dissolved in the developer sump, more defoamer may be required for defoaming.
EQUIPMENT:
Defoamer EC-D (RDZ-1610) is compatible with all materials used in liquid processing equipment.
SAFETY:
Defoamer EC-D (RDZ-1610) is non-hazardous.
DISPOSAL:
Defoamer EC-D (RDZ-1610) is biodegradable and "in use" concentration may be deposited legally into any sewer system, provided that other contaminants are not in the solution.
PACKAGING:
Defoamer EC-D (RDZ-1610) is available in 1 gallon bottles, 5 gallon pails, and 15 and 55 gallon drums.
RD Chemical Company makes these recommendations in good faith, based on laboratory and field testing. Ultimate responsibility for propriety of use, however, must rest with the purchaser and user. RD Chemical Company recommends thorough testing of its products, before use.
Article originally appeared on RD Chemical Company - Manufacturing Chemists (http://rdchem.com/).
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